GAS DISTRIBUTION SYSTEM FOR OPTIMIZATION OF THE TECHNOLOGICAL PROCESS OF COATING IN AN UNBALANCED MAGNETRON SPUTTERING INSTALLATION
نویسندگان
چکیده
The paper proposes a new design solution for regulating the distribution of working gases in vacuum chamber installation (UDP -850/4) unbalanced magnetron sputtering, which will improve mode and quality application multilayer nano-coatings. Constructive documentation manufacturing gas system has been prepared, as well instructions assembly to chamber.
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ژورنال
عنوان ژورنال: Vide. Tehnolo?ija. Resursi
سال: 2021
ISSN: ['2256-070X', '1691-5402']
DOI: https://doi.org/10.17770/etr2021vol3.6525